Hydrogen Silesquioxane
Hydrogen silsesquioxane (HSQ) from DisChem is a critical component for electron beam lithography, offering exceptional pitch resolution, sensitivity, and etch resistance. Used in negative tone resists, HSQ ensures precise patterning and reliable performance in advanced microlithography processes. DisChem’s HSQ products are available with immediate lead times and guaranteed shelf life, making them a trusted choice for semiconductor manufacturing and other high-tech applications.
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