Hsq Negative Ebl Resist
DisChem's HSQ negative EBL resist is tailored for precision in electron beam lithography. Utilizing hydrogen silsesquioxane, this resist delivers superior pitch resolution, sensitivity, and etch resistance. It is perfect for direct write thin film applications, ensuring high-quality pattern transfer and minimal process waste. With prompt availability and guaranteed shelf life, DisChem’s HSQ negative EBL resist is the go-to solution for advanced lithographic processes.
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