H-Siq Resist
DisChem's H-SiQ resist is a high-performance hydrogen silsesquioxane-based resist designed for electron beam lithography. This negative tone resist offers excellent pitch resolution, sensitivity, and etch resistance, making it ideal for direct write thin film applications. With immediate availability and a lead time of less than one week, H-SiQ resist provides consistent, reliable performance for advanced semiconductor manufacturing and other high-tech industries.
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