DisChem, Inc
DisChem HSQ is a specialized hydrogen silsesquioxane resist designed for electron beam lithography. This negative tone resist delivers top-notch pitch resolution, sensitivity, and etch resistance, making it perfect for high-precision patterning. Suitable for direct write thin film applications, DisChem HSQ ensures consistent quality and performance, with immediate availability and a lead time of less than one week. Trust DisChem for your advanced lithographic needs and achieve superior results.
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